Chromium Sputtering Target High Purity Metal Plate for Thin Film Coating_Metallurgy & Mining_Metallurgy , Mining & Energy_Products

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Chromium Sputtering Target High Purity M
CN ¥150.00

品牌：: Fast Silver

Origin: Made In China

Label: Chromium , Cr Sputtering target , High purity metal

High Purity Chromium Sputtering Target for Thin Film Coating

Pure single metal is the basic material in the fields of semiconductor, electronics and scientific research, high-purity metal materials have been widely used in various industries, including semiconductors, solar cells, electronics, optics, LEDs, flat panel displays, aerospace, military, decorative and other industrial applications and scientific research applications. In order to meet the diversified needs of many fields, Fast Silver can customize various material size and states, purity 3N-7N from gram to ton.

Item: Chromium Target

Purity: 99.95%

Size: Customized

Shape: Round planar, rectangular, tube, as request

Contacts

Company Name: Tengzhou Fast Silver Trading Co., Limited

Name:: Mr. Sharon Tung

Telephone: +86-632-5160196

Address

Operational Address: No. 825, Xin Xing Building

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